Atomic layer deposition

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41

Summer school Atomic Layer Deposition: Method and Applications July 6 – 10, 2015Brescia, ITALY

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Source URL: www.instm.it

Language: English - Date: 2015-05-07 10:37:41
    42Summer school Atomic Layer Deposition: Method and Applications July 6 – 10, 2015 Brescia, ITALY  Location

    Summer school Atomic Layer Deposition: Method and Applications July 6 – 10, 2015 Brescia, ITALY Location

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    Source URL: www.instm.it

    Language: English - Date: 2015-03-11 07:05:34
      43European Cooperation  Brussels, 15 May 2014 in the field of Scientific and Technical Research

      European Cooperation Brussels, 15 May 2014 in the field of Scientific and Technical Research

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      Source URL: w3.cost.eu

      Language: English - Date: 2014-05-16 08:14:04
      44Law / Medical privacy / Ethics / Privacy / Identity management

      Summer school Atomic Layer Deposition: Method and Applications July 6 – 10, 2015 Brescia, ITALY

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      Source URL: www.instm.it

      Language: English - Date: 2015-05-07 10:28:49
      45KAUST Repository High Electron Mobility Thin-Film Transistors Based on Solution-Processed Semiconducting Metal Oxide Heterojunctions and Quasi-Superlattices

      KAUST Repository High Electron Mobility Thin-Film Transistors Based on Solution-Processed Semiconducting Metal Oxide Heterojunctions and Quasi-Superlattices

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      Source URL: repository.kaust.edu.sa

      Language: English - Date: 2015-05-31 04:48:59
      46Atomic Layer Deposition (ALD) Process Solutions from MKS Instruments

      Atomic Layer Deposition (ALD) Process Solutions from MKS Instruments

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      Source URL: www.mksinst.com

      Language: English - Date: 2011-10-14 10:03:01
      47NorthStar ALD TM Engines for Thin Film Innovation  SVT Associates, Inc.

      NorthStar ALD TM Engines for Thin Film Innovation SVT Associates, Inc.

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      Source URL: www.svta.com

      Language: English - Date: 2012-09-13 12:40:38
      48Photon Factory Activity Report 2009 #27 Part BSurface and Interface 2C/2008S2003  Annealing effects of in-depth profiles in TiN/LaO/HfSiO/SiO2/Si gate stack

      Photon Factory Activity Report 2009 #27 Part BSurface and Interface 2C/2008S2003 Annealing effects of in-depth profiles in TiN/LaO/HfSiO/SiO2/Si gate stack

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      Source URL: pfwww.kek.jp

      Language: English - Date: 2010-12-27 22:22:07
      49Photon Factory Activity Report 2008 #26 Part BSurface and Interface 2C/2005S2-002 Control of oxidation and reduction in HfSiON/Si through N2 exposure Hiroyuki KAMADA*1, Tatsuhiko TANIMURA1, Satoshi TOYODA1-3, Hir

      Photon Factory Activity Report 2008 #26 Part BSurface and Interface 2C/2005S2-002 Control of oxidation and reduction in HfSiON/Si through N2 exposure Hiroyuki KAMADA*1, Tatsuhiko TANIMURA1, Satoshi TOYODA1-3, Hir

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      Source URL: pfwww.kek.jp

      Language: English - Date: 2010-01-05 10:36:03
      50Photon Factory Activity Report 2009 #27 Part BSurface and Interface 2C/2008S2003  Interfacial reactions for Ru metal-electrode/HfSiON gate stack structures studied

      Photon Factory Activity Report 2009 #27 Part BSurface and Interface 2C/2008S2003 Interfacial reactions for Ru metal-electrode/HfSiON gate stack structures studied

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      Source URL: pfwww.kek.jp

      Language: English - Date: 2010-12-27 22:22:07